Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography

Direct laser writing (DLW) enables arbitrary three-dimensional nanofabrication. However, the diffraction limit poses a major obstacle for realizing nanometer-scale features. Furthermore, it is challenging to improve fabrication efficiency using currently prevalent single-focal-spot systems, which cannot perform high-throughput lithography. To overcome these challenges, parallel peripheral-photoinhibition lithography system with sub-40-nm two-dimensional feature size and sub-20-nm suspended line width was developed in our study, based on two-photon polymerization DLW. The of twice that conventional systems both uniform complex structures. proposed facilitates realization portable DLW higher resolution throughput.